What does CAP stand for?
CAP stands for Cathodic Arc Plasma
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The tutorial number is intended to indicate the level of tutorial specialization - the lower numbers refer to tutorials which are basic or introductory in nature, and the higher numbers refer to tutorials that offer a more specialized treatment of a specific topic. Each tutorial title is linked to the tutorial description and to the instructor's biographical sketch. The tutorial description is then linked directly to the detailed tutorial syllabus. Tutorial Titles The group of tutorials on Vacuum Technology, Components and Systems (V-201, V-202, and V-203) is designed in modular form where each module can be taken as an individual stand-alone tutorial, or all three tutorials can be taken at a discounted fee. V-201 High Vacuum System Operation V-202 Vacuum System Gas Analysis V-203 Vacuum Materials and Large System Performance V-204 Vacuum Systems, Materials and Operation V-206 Helium Leak Detection Theory and Technology V-207 Practical Aspects of Vacuum Technology: Operation and Maintenance of Production Vacuum Systems V-208 Basic Analysis of Mass Spectrometer Spectra New! V-304 Cryogenic High Vacuum Pumps M-101 Basic Principles of Color Measurement M-102 Introduction to Ellipsometry (half-day) C-102 Introduction to Evaporation and Sputtering (half-day or full-day) C-103 An Introduction to Physical Vapor Deposition (PVD) Processes C-104 An Introduction to Optical Coatings C-105 Introduction to Optical Coating Design New! C-203 Sputter Deposition (two – day course) C-204 Basics of Vacuum Web Coating C-207 Evaporation as a Deposition Process C-208 Sputter Deposition in Manufacturing C-209 Material Science Aspects of Plasma Processing (half-day) C-210 Introduction to Plasma Processing Technology (half day) C-211 Sputter Deposition onto Flexible Substrates C-212 Troubleshooting for Thin Film Deposition Processes C-213 Introduction to Smart Materials C-214 Pulsed Plasma Processing C-215 Vacuum Coatings and Plasma Processing for Biomedical Applications C-216 Practical Design of Optical Thin Films C-217 Practical Production of Optical Thin Films C-304 ITO and Other Transparent Conductive Coatings: Fundamentals, Deposition, Properties, and Applications C-306 Non-Conventional Plasma Sources and Methods in Processing Technology (half day or full day) NEW C-307 Cathodic Arc Plasma.
Our technology is based on Filtered Cathodic Arc Plasma.